\n Extending AE\u2019s leadership in process power, this new line of Remote Plasma Sources delivers reliable performance at a broad range of flow rates, increasing productivity in semiconductor process equipment <\/p>\n
DENVER, COLORADO –\u00a0Media OutReach<\/a>\u00a0–\u00a018 December 2020 –\u00a0Advanced \u00a0<\/p>\n “When customers invited AE to step MAXstream delivers substantial improvements over competitors’ \u00a0<\/p>\n AE’s MAXstream RPS products facilitate drop-in compatibility \u00a0<\/p>\n The MAXstream line consists of RPS systems with gas flow of “Plasma processes requiring chamber cleaning are used in the \u00a0<\/p>\n For detailed technical specifications, visit the MAXstream product page<\/a>. <\/p>\n
\nEnergy (Nasdaq: AEIS) — a
\nglobal leader in highly engineered, precision power conversion, measurement,
\nand control solutions — today<\/a> announced the launch of its
\nnew MAXstreamTM <\/sup>remote plasma source (RPS) product line for plasma
\ncleaning of process chambers used in semiconductor device manufacturing. With offerings
\navailable across a broad operating range, the MAXstream line delivers higher
\npower accuracy, best-in-class plasma ignition and increased reliability, making
\nit the most capable RPS solution in the market.\u00a0\n<\/p>\n![](\"https:\/\/release.media-outreach.com\/release.php\/Images\/Thumb\/500x0\/112805\/MAXstream-Remote-Plasma-Source.jpg#image-112805\")
<\/p>\n
\nin and help meet the industry’s need for a high performance and reliable RPS, we
\nmade it happen,” said Advanced Energy Vice President and General Manager,
\nSemiconductor Products, Peter Gillespie. “Not only does the new MAXstream
\nproduct line provide a cost-effective and reliable RPS solution for customers’
\nprocess tools, but it also accelerates AE’s penetration to the approximately $150
\nmillion per year RPS market, which has seen little innovation in recent years 1<\/sup>.
\nWe are encouraged by the positive responses we have received so far and
\nanticipate further success as we continue shipments to multiple OEM customers
\nthis month.”<\/p>\n
\nRPS solutions. Its dual ignition core design delivers best-in-class plasma
\nignition reliability. The reliable and strike-every-time ignition means more
\nconsistent operation and less downtime. MAXstream
\nalso leverages AE’s proven and differentiated plasma source materials and
\ntechnology to ensure long chamber life and low particle generation.<\/p>\n
\nwith existing RPS systems to enable simple design-in compatibility as well as
\nseamless field upgrades. By replacing an underperforming RPS with MAXstream,
\ncustomers improve equipment productivity and gain higher performance reliability.
\nThey also gain access to AE’s best-in-class global service and support, with
\nover a dozen service centers and worldwide field service and applications
\nsupport.<\/p>\n
\n3, 6, 8, 10, and 12 liters per minute (MAXstream
\n300, 600, 800, 1000, and 1200, respectively), enabling
\ncustomers to optimize price and performance for their specific process. The
\nMAXstream 300 is designed for lower flow applications (up to 3 liters per
\nminute of cleaning gas) and has a smaller form factor than the other higher
\nflow models. <\/p>\n
\nproduction of almost every type of semiconductor chip,” said Shaun Wilson, general
\nmanager, remote plasma sources, Advanced Energy. “By bringing MAXstream to the
\nmarket, we provide our customers a powerful, reliable, and cost-effective solution
\nfor process chamber cleaning. We also minimize equipment downtime and help the
\nsemiconductor industry fulfill the demands of the data economy.”<\/p>\n